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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35629


    Title: Growth of Co clusters on thin films Al2O3/NiAl(100)
    Authors: Luo M. F.,Chiang C. I.,Shiu H. W.,Sartale S. D.,Wang T. Y.,Chen P. L.,Kuo,C. C.
    Contributors: 奈米科技研究中心
    Keywords: OXIDE-FILMS;NIAL(001);DEPOSITS;ALUMINA;GOLD
    Date: 2006
    Issue Date: 2010-07-07 15:45:54 (UTC+8)
    Publisher: 中央大學
    Abstract: We present a scanning tunnel microscopy study of Co clusters grown through vapor deposition on Al2O3 thin films over NiAl(100) at different coverages and temperatures. Formation of Co clusters was observed at 90, 300, 450, and 570 K. At the three lower te
    Relation: JOURNAL OF CHEMICAL PHYSICS
    Appears in Collections:[奈米科技研究中心 ] 期刊論文

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