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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35648


    Title: Annealing dependence of residual stress and optical properties of TiO2 thin film deposited by different deposition methods
    Authors: Chen,Hsi-Chao;Lee,Kuan-Shiang;Lee,Cheng-Chung
    Contributors: 薄膜技術研究中心
    Keywords: ION-ASSISTED DEPOSITION;COLUMNAR MICROSTRUCTURE;OXIDE FILMS
    Date: 2008
    Issue Date: 2010-07-07 15:47:00 (UTC+8)
    Publisher: 中央大學
    Abstract: Titanium oxide (TiO2) thin films were prepared by different deposition methods. The methods were E-gun evaporation with ion-assisted deposition (IAD), radio-frequency (RF) ion-beam sputtering, and direct current (DC) magnetron sputtering. Residual stress
    Relation: APPLIED OPTICS
    Appears in Collections:[薄膜技術研究中心] 期刊論文

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