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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35650


    Title: Developing new manufacturing methods for the improvement of AlF3 thin films
    Authors: Lee,Cheng-Chung;Liao,Bo-Huei;Liu,Ming-Chung
    Contributors: 薄膜技術研究中心
    Keywords: MICROSTRUCTURE-RELATED PROPERTIES;FLUORIDE FILMS;193 NM;OPTICAL COATINGS;ULTRAVIOLET;LITHOGRAPHY;EVAPORATION;PLASMAS;BOAT
    Date: 2008
    Issue Date: 2010-07-07 15:47:03 (UTC+8)
    Publisher: 中央大學
    Abstract: In this research, the plasma etching mechanism which is applied to deposit AlF3 thin films has been discussed in detail. Different ratios of O-2 gas were injected in the sputtering process and then the optical properties and microstructure of the thin fil
    Relation: OPTICS EXPRESS
    Appears in Collections:[薄膜技術研究中心] 期刊論文

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