Developing new manufacturing methods for the improvement of AlF3 thin films

NCUIR > Research Center > Thin Film Technology Center > journal & Dissertation > Item 987654321/35650

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35650

Title:	Developing new manufacturing methods for the improvement of AlF3 thin films
Authors:	Lee,Cheng-Chung;Liao,Bo-Huei;Liu,Ming-Chung
Contributors:	薄膜技術研究中心
Keywords:	MICROSTRUCTURE-RELATED PROPERTIES;FLUORIDE FILMS;193 NM;OPTICAL COATINGS;ULTRAVIOLET;LITHOGRAPHY;EVAPORATION;PLASMAS;BOAT
Date:	2008
Issue Date:	2010-07-07 15:47:03 (UTC+8)
Publisher:	中央大學
Abstract:	In this research, the plasma etching mechanism which is applied to deposit AlF3 thin films has been discussed in detail. Different ratios of O-2 gas were injected in the sputtering process and then the optical properties and microstructure of the thin fil
Relation:	OPTICS EXPRESS
Appears in Collections:	[Thin Film Technology Center] journal & Dissertation

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