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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35653


    Title: Fluoride antireflection coatings deposited at 193 nm
    Authors: Liu,Ming-Chung;Lee,Cheng-Chung;Liao,Bo-Huei;Kaneko,Masaaki;Nakahira,Kazuhide;Takano,Yuuichi
    Contributors: 薄膜技術研究中心
    Keywords: MICROSTRUCTURAL PROPERTIES;OPTICAL COATINGS;THIN-FILMS;ULTRAVIOLET;MGF2;LITHOGRAPHY;EVAPORATION;GROWTH;BOAT
    Date: 2008
    Issue Date: 2010-07-07 15:47:08 (UTC+8)
    Publisher: 中央大學
    Abstract: Antireflection coatings for 193 nm composed of low-index (MgF2 and AlF3) and high-index (LaF3 and GdF3) materials are deposited by the resistive heating boat method at a substrate temperature of 300 degrees C. The optical characteristics (reflectance and
    Relation: APPLIED OPTICS
    Appears in Collections:[薄膜技術研究中心] 期刊論文

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