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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35656


    Title: Process for deposition of AF(3) thin films
    Authors: Liao,Bo-Huei;Liu,Ming-Chung;Lee,Cheng-Chung
    Contributors: 薄膜技術研究中心
    Keywords: MICROSTRUCTURE-RELATED PROPERTIES;MAGNESIUM FLUORIDE FILMS;193 NM;BOAT EVAPORATION;OPTICAL COATINGS;ULTRAVIOLET;LITHOGRAPHY
    Date: 2008
    Issue Date: 2010-07-07 15:47:13 (UTC+8)
    Publisher: 中央大學
    Abstract: We fabricated aluminum fluoride (AIF(3)) thin films by pulsed DC magnetron sputtering with various CF4 flow rates and sputtering powers. Our method is distinct from the conventional deposition process in that we used inexpensive Al (99.99% purity) as the
    Relation: APPLIED OPTICS
    Appears in Collections:[薄膜技術研究中心] 期刊論文

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