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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35660


    Title: AlF3 thin films deposited by reactive magnetron sputtering with Al target
    Authors: Lee,Cheng-Chung;Liao,Bo-Huei;Liu,Ming-Chung
    Contributors: 薄膜技術研究中心
    Keywords: OPTICAL COATINGS;FLUORIDE FILMS;193 NM;ULTRAVIOLET;LITHOGRAPHY
    Date: 2007
    Issue Date: 2010-07-07 15:47:19 (UTC+8)
    Publisher: 中央大學
    Abstract: Aluminum fluoride thin films have been deposited by magnetron sputtering of an aluminum target with CF4, and CF4 mixed O-2 as the working gas onto a room temperature substrate. The quality of the coated AlF3 film applied with 25W sputtering power using CF
    Relation: OPTICS EXPRESS
    Appears in Collections:[薄膜技術研究中心] 期刊論文

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