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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35681


    Title: X-ray photoelectron spectroscopy study of thin TiO2 films cosputtered with Al
    Authors: Jin-Cherng Hsu,Paul W. Wang,Cheng-Chung Lee
    Contributors: 薄膜技術研究中心
    Keywords: BEAM SPUTTER-DEPOSITION;OXIDE-FILMS;SILICON DIOXIDE;TITANIUM;EVAPORATION
    Date: 2006
    Issue Date: 2010-07-07 15:47:49 (UTC+8)
    Publisher: 中央大學
    Abstract: In this study, titanium dioxide (TiO2) films were fabricated by cosputtering of a titanium (Ti) target and an aluminum (Al) slice in a smaller area by an ion-beam sputtering deposition method. The sputtered films were postannealed at 450 degrees C. The x-
    Relation: APPLIED OPTICS
    Appears in Collections:[薄膜技術研究中心] 期刊論文

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