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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35683


    Title: Influence of thermal annealing and ultraviolet light irradiation on LaF3 thin films at 193 nm
    Authors: Lee,CC;Liu,MC;Kaneko,M;Nakahira,K;Takano,Y
    Contributors: 薄膜技術研究中心
    Keywords: MICROSTRUCTURAL PROPERTIES;VACUUM ULTRAVIOLET;FLUORIDE FILMS;COATINGS;LITHOGRAPHY
    Date: 2005
    Issue Date: 2010-07-07 15:47:52 (UTC+8)
    Publisher: 中央大學
    Abstract: Lanthanum fluoride.(LaF3) thin films were prepared by resistive heating evaporation and electron-beam gun evaporation under the same deposition rate, deposition substrate temperature, and vacuum pressure. The coated LaF3 films were then treated by heat an
    Relation: APPLIED OPTICS
    Appears in Collections:[薄膜技術研究中心] 期刊論文

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