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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35685


    Title: Low alkaline contamination bilayer bottom antireflective coatings in F-2 excimer laser lithography
    Authors: Chen,HL;Chuang,YF;Lee,CC;Ko,FH;Hsieh,CI;Huang,TY
    Contributors: 薄膜技術研究中心
    Keywords: THIN-FILMS;RESIST
    Date: 2002
    Issue Date: 2010-07-07 15:47:55 (UTC+8)
    Publisher: 中央大學
    Abstract: A bilayer bottom antireflective coating (BARC) structure composed of tetraethoxysilane (TEOS) oxide and silicon nitride film stacks is demonstrated for F-2 excimer laser (157 nm) lithography. The top TEOS oxide film is an NH3 contaminant-free material tha
    Relation: ELECTROCHEMICAL AND SOLID STATE LETTERS
    Appears in Collections:[薄膜技術研究中心] 期刊論文

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