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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35691

    Title: Self-assembled InN dots grown on GaN with an In0.08Ga0.92N intermediate layer by metal organic chemical vapor deposition
    Authors: Fu,Y. K.;Kuo,C. H.;Tun,C. J.;Kuo,C. W.;Lai,W. C.;Chi,G. C.;Pan,C. J.;Chen,M. C.;Hong,H. F.;Lan,S. M.
    Contributors: 光電科學研究中心
    Date: 2008
    Issue Date: 2010-07-07 15:49:04 (UTC+8)
    Publisher: 中央大學
    Abstract: Indium nitride (InN) dots grown on sapphires by metal organic chemical vapor deposition (MOCVD) with an In0.08Ga0.92N intermediate layer were demonstrated. Inserting an In0.08Ga0.92N layer between InN and GaN reduced the average size of InN dots, increase
    Appears in Collections:[光電科學研究中心] 期刊論文

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