多面體寡體矽石/甲基丙烯酸脂系之奈米結構; 混成材料之研究 Study polyhedral oligomeric silsequioxanes/ methylacrylate nanostructured hybrid materials

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Title:	多面體寡體矽石/甲基丙烯酸脂系之奈米結構;混成材料之研究 Study polyhedral oligomeric silsequioxanes/ methylacrylate nanostructured hybrid materials
Authors:	施宏道;Heng-Dau Shr
Contributors:	化學工程與材料工程研究所
Keywords:	甲基丙烯酸脂;多面體寡體矽石;奈米結構;nanostructured;Study polyhedral oligomeric silsequioxanes;methylacrylate
Date:	2003-06-06
Issue Date:	2009-09-21 12:21:43 (UTC+8)
Publisher:	國立中央大學圖書館
Abstract:	本實驗以Methyl methacrylate (MMA)單體為主，加入與MMA相似官能基Acrylates系統的多面體矽氧烷寡聚物 (Polyheral Oligomeric Silsesquioxanes，POSS)。POSS又細分為兩種，一為MethacrylIsobutyl -POSS【POSS(MA0702)】，另一個為MethacrylEthyl-POSS【POSS(MA0717)】，兩者雙鍵官能基的部分是一樣的，唯一不同的是在Si-O外的碳氫化合物支鏈，分別為butyl與methyl，其分子量分別為943.64g/mole 和747.27g/mole。藉由奈米粒子POSS與MMA共聚合，來改善PMMA性質。由FTIR、NMR、DSC、GPC的結果，當POSS重量比例低於20wt%，Free radical:AIBN重量比為1wt%，MMA與POSS能產生共聚合效果，當POSS重量比例超過20wt%時，共聚合效果並不好。加大AIBN重量比為2.5wt%時，POSS重量比例超過20wt%，才能與MMA產生共聚合效果。就不同POSS比較，發現POSS(MA0717)與MMA共聚合效果比POSS(MA0702)好。由TGA結果可發現，當POSS重量比例越高時，其材料的裂解溫度會越高，同時到了700℃後，殘留量也會隨著POSS的量而增加。材料機械性部分，利用照相以及DMA的分析可知，隨著POSS重量比例的增加，材料硬度也跟著增加；但是POSS重量比例超過20 wt%，材料因為過於硬脆而無法成型，隨著POSS比例越高時，材料成形結果越差。另外由TMA結果發現，材料的Tg點也會隨著POSS重量比例的增加而增加。最後利用照相以及DMA的分析發現，PMMA本身即為透明材料，當POSS共聚合後，材料仍然成透明狀，所有比例共聚合，於可見光範圍下，透光率居只有0.15~0.35之間，非常透明的狀態。 A series of novel hybrid Methyl methacrylate (MMA) and Polyheral Oligomeric Silsesquioxanes(POSS) are synthesizedand characterized. MethacrylIsobutyl -POSS【POSS(MA0702)】and MethacrylEthyl-POSS【POSS(MA0717)】 have been investigated. Both compounds have the same Acrylates groups, but the inorganic Si8O12 spherical core of POSS surrounded by seven inert organic corner groups are different. One is butyl, the other is methyl. Molecular weights are 943.64g/mole and 747.27g/mole respectively. The influence of the weight fraction of POSS and the corner group composition on properties have been examined. The prepared polymer hybrids were characterized by FTIR、NMR、DSC、GPC.When the random copolymer contain 20wt% POSS monomer and 1wt% AIBN, the polymer copolymerized completely. While the random copolymer contain more than 20wt% POSS monomer, AIBN must be added 2.5wt%, the polymer copolymerized completely. The copolymerizatoin of MMA with POSS(MA0702) and POSS(0717) respectively, POSS(MA0717)is well reactor than that of POSS(MA0702). TGA, DMA, TMA and picture of digital camera show that the Td, Tg and roughness is increased as the increased of the ratio of POSS. When the temperature over 700℃, the residual weight increase with increasing the ratio of POSS. As the result of digital camera and UV, when POSS copolymerized with MMA, the material is also transparent. Under the range of visible , the transmittance is about 0.15~0.35.
Appears in Collections:	[National Central University Department of Chemical & Materials Engineering] Electronic Thesis & Dissertation

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