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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/3771


    Title: 電子束微影製作三維非平面微結構及結構表面改質;Fabrication of Three-dimensional Devices with Electron Beam Lithography and Surface Treatment for Application
    Authors: 陳宣克;Hsuan-Ko Chen
    Contributors: 化學工程與材料工程研究所
    Keywords: 結構表面改質;微結構;電子束微影;Electron Beam Lithography;Three-dimensional Devices;Surface Treatment
    Date: 2003-06-17
    Issue Date: 2009-09-21 12:22:14 (UTC+8)
    Publisher: 國立中央大學圖書館
    Abstract: 摘要 在本篇論文中研究的主題分為兩個部分。一個是以電子束微影製作三維非平面微結構;另一個是三維非平面微結構之表面改質。兩個研究主題的結果,皆期望未來能於微流體晶片上有所應用。 在以電子束微影製作三維非平面微結構的部分。本研究焦點著重於利用電子束直寫及控制不同劑量的優點對SU8-50阻劑進行曝光,首先我們研究SU8-50阻劑厚度對電子束曝光劑量的關係,之後設計圖形並參考厚度對曝光劑量的關係,進而製作我們所要的非平面微結構,包括凹面、斜面及凸面結構,此三種結構期望未來能應用於生物晶片中的微流體晶片,讓微通道內之流體流動方式能更多樣化。在製作出三種傾斜微結構後,以此基礎進一步嘗試製作些變化性的微結構,包括分子篩、螺旋及環狀結構,同樣期望這些結構在未來也能有所應用。除此之外,SU8-50阻劑在電子束曝光後的反應機制,我們也會作一詳細的討論。 在三維非平面微結構之表面改質的部分。本研究焦點著重於利用氧電漿對微結構進行親疏水性的表面改質,首先將微結構經由不同時間的氧電漿處理後,藉由量測水與結構表面的接觸角,判定其親疏水性變化,並利用SEM觀察表面型態及AFM量測表面粗糙度,討論親疏水性的變化與表面型態及粗操度的關係。微結構表面親疏水性的改質,是為了在未來讓微通道能適應更多不同性質之流體,使流體於微通道內流動更加順暢。除此之外,我們也會針對SU8-50阻劑於氧電漿處理前後的熱穩定性與其他阻劑作一詳細的比較。最後就SU8-50阻劑對熱氧化矽及多晶矽,分別在氣體CHF3 / CF4 及Cl2 / O2的蝕刻選擇比,作一詳細的討論。 Abstract There are two major parts in this thesis. One is the fabrication of three-dimensional non-planar devices with electron beam lithography. The other is the surface treatment and characterization for application in microfluidic device. The design of non-planar microfluidic channel for the fabrication of three-dimensional non-planar devices with electron beam lithography such as oblique structure is beneficial for future bio-devices. The oblique structure exhibits the advantage of driving fluid with diversification. This study focuses on the modification of SU-8 resist by e-beam and fabrication of three-dimensional devices. The oblique structure of SU-8 polymer material at special dose design is successfully fabricated by electron beam technology. Furthermore, the convex profile, the concave profile or slopes of the profiles can be obtained by only changing the dosage and the unit distance. In addition, the reaction mechanism of the SU-8 material under electron beam exposure is discussed in detail. The SU8-50 resist about the surface treatment and characterization for application in microfluidic device is used to fabricate the micro-channel devices and the character of hydrophobic and hydrophilic in micro-channel is evaluated. Oxygen-plasma-treated is used to affect the hydrophobic and hydrophilic surfaces of thickness film. From contact angle measurement, the SU8-50 film transformed the hydrophobic property into hydrophilic property after suitable oxygen plasma treatment. The SEM analysis revealed the spherulitic structure of nano-lamellae from polymerization of SU8-50 resists with oxygen plasma-treated time. AFM is used to study the roughness on the surface of oxygen plasma treated SU8-50 membrane. In addition, the etching selectivity of thermal oxide and poly-Si has been examined with the gas CHF3 / CF4 and Cl2 / O2, respectively.
    Appears in Collections:[化學工程與材料工程研究所] 博碩士論文

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