Ultrathin TiO2 amorphous films for high transmittance APSM blanks at 157 and 193 nm wavelength simultaneously

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/38702

Title:	Ultrathin TiO2 amorphous films for high transmittance APSM blanks at 157 and 193 nm wavelength simultaneously
Authors:	Lai,FD;Chang,CM;Wang,LA;Yih,TS
Contributors:	物理研究所
Keywords:	SYSTEMS
Date:	2003
Issue Date:	2010-07-08 13:35:48 (UTC+8)
Publisher:	中央大學
Abstract:	Ultrathin TiO2 amorphous films are deposited on ultraviolet grade fused silica substrates and CaF2 by using rf reactive unbalanced magnetron sputtering from a Ti metal target in atmosphere of Ar and O-2. For an O-2/Ar flow rate ratio of more than 1.5, the
Relation:	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Appears in Collections:	[Graduate Institute of Physics] journal & Dissertation

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