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    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/38928


    題名: Dynamic behaviour of a nanoscale-patterned phospholipid thin film on mica and silicon studied by atomic force microscopy
    作者: Luo,MF;Sua,YH;Hu,GR;Nien,CH;Hsueh,YW;Chen,P
    貢獻者: 物理研究所
    關鍵詞: DIP-PEN NANOLITHOGRAPHY;LIPID-MEMBRANES;LANGMUIR MONOLAYERS;BILAYER-MEMBRANES;PHASE-TRANSITIONS;DOMAINS;ORGANIZATION;LITHOGRAPHY;RELAXATION;TENSION
    日期: 2009
    上傳時間: 2010-07-08 13:59:29 (UTC+8)
    出版者: 中央大學
    摘要: The temporal evolution of the morphology of nanoscale-patterned phospholipid thin films on mica and silicon surfaces has been investigated with an atomic force microscope (AFM). The AFM images reveal that nanoscale scratch lines on thin films prepared on mica contract with time and eventually form roundish holes. An elevated sample temperature accelerates this morphological evolution. We model such an evolution based on the interplay of the thin-film surface line tension and the friction between the thin film and the substrate. The results show that the temperature-dependent contraction is governed by the ratio of the friction coefficient and the surface line tension. The friction at the lipid/mica interface decreases to a seventh as the sample temperature rises from 18 to 60 degrees C. This model is supported by experiments on silicon surfaces, on which contraction of the scratch patterns is limited because of an expected greater interfacial friction. (C) 2008 Elsevier B.V. All rights reserved.
    關聯: THIN SOLID FILMS
    顯示於類別:[物理研究所] 期刊論文

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