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    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/43420


    題名: 極小孔徑陽極氧化鋁模板之製備及在矽基材上生成大面積規則排列氧化鋁模板及奈米點陣列之研究;Synthesis of Freestanding AAO Template with Ultra-small Pore Size, and Fabrication of Well-ordered Thin AAO Templates and Nanodots Array on Si Substrate
    作者: 劉柏廷;Po-ting Liu
    貢獻者: 化學工程與材料工程研究所
    關鍵詞: 陽極氧化鋁;奈米點陣列;nanodots array;AAO
    日期: 2010-07-28
    上傳時間: 2010-12-08 13:37:14 (UTC+8)
    出版者: 國立中央大學
    摘要: 本研究之內容主要分成極小孔徑陽極氧化鋁奈米模板與矽基規則陽極氧化鋁奈米模板之製備兩部分,並針對其孔洞排列、孔徑大小與分佈進行量測分析。在製備出矽基材上大面積規則排列陽極氧化鋁奈米模板後,利用此模板製備兩種零維奈米點陣列,並對各奈米點之形貌與晶體結構進行分析鑑定。 在極小孔徑陽極氧化鋁奈米模板的部分,我們成功地利用高純度鋁片以兩次陽極氧化處理法製備出孔徑可調變 ( 10 - 60 nm ) 之陽極氧化鋁,並經由移除鋁片與氧化鋁孔道底部之阻障層得到極小孔徑陽極氧化鋁模板 ( 平均孔徑大小 < 10 nm ) ,此極小孔徑奈米模板相信將可用於大量製備極細一維奈米線陣列結構。 在矽晶基材上製備低深寬比之規則陽極氧化鋁奈米模板方面,本研究結合奈米球微影術與電漿蝕刻技術,在矽基鋁薄膜上預置遮罩並定義鋁薄膜之反應區域進行一次陽極氧化處理,可成功地製備出大面積規則有序排列之矽基氧化鋁奈米薄膜,並經由磷酸蝕刻底部阻障層後可得到大面積孔洞規則排列且孔徑可由奈米球遮罩調變之矽基氧化鋁奈米模板。應用此製程移除表層之氧化鋁模板,可得到大面積規則有序排列之奈米點陣列,經 AFM、TEM 與 SAED 鑑定後為非晶形之氧化矽奈米點陣,其高度約為 32 - 40 nm 。此外我們也使用上述所製備之低深寬比規則氧化鋁模板結合電子槍蒸鍍鎳金屬,經移除氧化鋁模板後可得到大面積規則有序排列之奈米點陣列,經 TEM 與 SAED 鑑定分析可知其為多晶之鎳金屬奈米點陣列結構。 In this study, we show the successfully fabrication of two types of anodic aluminum oxide (AAO) templates. One is the free standing AAO nanotemplate with ultra-small pore size (<10nm), and the other is the thin AAO template with 2-D periodic nanopore structure on Si substrate. To fabricate free standing AAO nanotemplates, high purity Al foils were used as the start materials, and a two-step anodizing process was employed. In this works, the pore diameters of AAO nanotemplates can be tuned from 9 to 60 nm by varying the electrolyte composition, applied voltage, and processing temperature. The obtained AAO nanotemplates can be extended to fabricate a large amount of ultra-narrow nanowires. The present study also demonstrated that the thin AAO templates with well-ordered nanopore arrays were successfully fabricated on (001)Si substrates by employing the nanosphere lithography technique and selective anodic oxidation process. The pore diameter and the interspacing can be readily controlled by adjusting the diameters of the colloidal nanospheres and the anodic etching conditions. After removal of the AAO templates, large-area periodic SiOx nanodots array was found to form on Si substrate. Furthermore, the hexagonally arrayed porous AAO membrane can be used as the template for fabrication of metal nanodot arrays on Si substrate. After the deposition of Ni thin films and subsequent lift-off of the AAO template, the hexagonal periodic Ni nanodot arrays were found to form on the surface of (001)Si substrate. The size of the deposited Ni nanodots were measured to be about 170 nm, corresponding to the pore size of the thin AAO template. Based on TEM and SAED analyses, it is found that the crystal structure of Ni nanodots is polycrystalline.
    顯示於類別:[化學工程與材料工程研究所] 博碩士論文

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