在光學元件檢測的方法中，最常見的方法為雙波前干涉量測方法及焦平面位置上橫向像差的量測方法，目前技術所產生之量測結果分析都是單一視場的瞳孔相差量測，多重離軸像場瞳孔相差必須耗時一一量測。 本論文是以一種類似Ronchi test的量測方式，由光柵-狹縫量測法作為實驗的基礎，所發展出的全場像差量測裝置。實驗中以LCD陣列作為產生控制光柵輸出的裝置，並且配合陣列狹縫和陣列透鏡的調制，一次擷取出待測元件全視場像差分佈的情形，接著利用相移量測法，重建出各個視場的波前，並以數學函數擬合所有的離軸像差，得到全像場的相差描述函數：double Zernike coefficient。 這將是光學元件檢測中，第一次將光學元件全像場同時取像並將其量化，我們預期能利用此光學檢測方法配合double Zernike coefficient分析的數據，應用在光機組裝時的多重光學元件對位校正。 The geometrical test and the optical interferometry are popularly used to test on-axis optical systems or elements and yields quantified measurement. To measure off-axis aberration one can have a tested optical system place on the rotating nodal slide and measure off axis aberration field by field by rotating the slide. Our research is about the measurement of full-field aberration based on optical testing method similar to Ronchi test, named Grating-Slit test. The experiment used the liquid crystal display array to control the brightness of object and reach the function of grating. By using the slit- lens array, we can capture the simultaneous measurement of full-field aberration. Then through the phase shifting method, we can reconstruct the wavefront of each field captured. After that, the double Zernike polynomial is used to fit and quantify the full-field aberration. This experiment will be the first time gets the quantification of full-field aberration simultaneously. We expect that we can use this testing method to correct the opto-mechanical mis-alignment by double Zernike coefficient.
