對於一個製程昂貴的光學薄膜元件來說，更為精緻和精確的監控是必要的。光學監控因同時包含了薄膜厚度和折射率的資訊，被視為製鍍光學薄膜中較佳的監控方式。 而在一個成長的薄膜堆中，材料的折射率時常會改變，以致於每層薄膜的厚度往往需要修正，適當的停鍍點也因此往往需要重新評估計算。然而以往的監控方式，始終沒有辦法精確地解決這樣的問題。 為了精進傳統的監控方法，本文分析且模擬了成長中之薄膜的光學特性，推導出各個波長在各層停鍍點的變化率，以便能選擇最靈敏的監控波長，更精確的判斷切點(停鍍點)，製鍍出想要的厚度。由於折射率改變或前層切點誤判所造成的誤差，也經由傳統監控架構所被推導計算，找出對應的錯誤補償，以期能生產出更符合預期的成品。 另外，本文陳述了一個新型的監控系統，可同時擷取監控光的強度和`相位變化。利用新型的偏振干涉儀去抑制機械震動和消除空氣擾動的干擾，即時計算出沉積中的膜堆在每一刻的反射係數以及光學導納，提供了一個便捷、直接且全面性的光學監控方式。 The optical monitoring method is generally thought better than other methods to manufacture optical filters, and for a costly optical filter manufacture, more precise optical monitor is necessary. In a growing thin film stack, the refractive indices of materials usually change so that suitable thickness of each layer would not be the same as what we expected in the original design; hence the termination point of each thin film layer needs to be revised. However, the conventional monitoring methods never analytically solve this problem. For the improvement of optical monitor of optical coating productions, the optical behaviors of growing films were analyzed and some simulations were demonstrated in this dissertation. Sensitive monitoring wavelengths were chosen by numerical analysis to achieve precise monitor. Also, the way to find the refractive index change and misjudgment of cutting points (termination point) was derived from a traditional optical monitor structure and the corresponding error compensations were applied to get good output. Moreover, a novel optical monitoring system is proposed to extract the temporal phase change of the reflection coefficient of the growing film stacks. A polarization interferometers which frozen the vibration and air turbulence was used in this dissertation to directly detect fluctuating phase and magnitude of the reflection coefficient of a growing film stack as well as the real time optical admittance at normal incidence. It provides a brand new and global monitor method.
