本論文主要以自我複製技術(autocloning technique)來製作偏振分光鏡(polarization beam splitters)，並藉由有限時域差分法(Finite-Difference Time-Domain; FDTD) 來設計偏振分光鏡以及蒙地卡羅模擬法(Monte Carlo methods)來分析實際製作上可能會造成的誤差。 首先，從單層TiO2奈米結構膜開始研究，觀察隨蝕刻時間增長，結構膜表面形狀變化，找到合適的TiO2蝕刻速率方程式(etching rate function)，並模擬TiO2結構膜表面形狀曲線，同時找出最佳蝕刻TiO2結構膜的離子源電壓，以維持週期性結構膜Z字形形狀。 因在製程過程中，堆疊多層自我複製結構薄膜，其每層形狀角度有些許差異，藉由蒙地卡羅模擬法來探討自我複製式偏振分光鏡製作上的誤差，此外，再配合對稱膜堆應用於抗反射膜之設計，找出最佳的膜堆設計，而本研究利用電子槍蒸鍍系統與離子源助鍍製作自我複製式偏振分光鏡，其厚度約為8 μm，工作範圍約為200 nm(1300-1500 nm)可應用於紅外光區塊，而在1300 – 1350 nm其消光係數高達185，未來可應用於光通訊。 In this study, we have fabricated autocloned polarization beam splitters (PBSs) using autocloning technique and designed autocloned PBS by finite-difference time-domain (FDTD). Moreover, we have also analyzed the error of working range in PBS by Monte Carlo methods during fabrication process. Above all, we have researched TiO2 nano-structural films to observe the surface evolution of TiO2 structural films with increasing the etching time, figured out etching rate function of TiO2 structural films and simulated the surface profiles. And then, we have found the ion beam voltage, 600 V of TiO2 structural films is the best voltage to preserve the shape of zigzag films. We have discussed the error analysis of autocloned PBS according to the Monte Carlo method because the top angle for each layer was a little different during stacking multilayers autocloned thin films. However, we have utilized symmetric structure to design antireflection coating. And we have fabricated the autocloned PBS using electron beam gun evaporation with ion-beam-assisted depositon (IAD) successfully. The physical thickness was 8μm and the shape of zigzag was preserved. Besides, the autocloned PBS had broad working range about 200 nm (1300-1500 nm) in infrared region and achieved the average extinction ratio 185 from 1300 nm to 1350 nm.
