本研究計畫是以多像場光柵-狹縫光學測試法作為計畫研究之主軸並進行兩項延伸之應用研究-多元件光機定位誤差量測與無像差Light Field 成像的三年連續研究計畫。計畫初期將利用現有的量測硬體與相關之量測軟體技術，以一創新之狹縫- 微鏡片陣列 架構，在同時間內以相移檢測法量測一光學系統中多達400 個成像位置之離軸像差，亦即「同時、多點、全場之相差量測」。預期此光學檢測系統將是全世界第一個有能力「同時量測多點全場像差」的光學檢測系統。利用光學系統中的任一元件的對位擾動誤差所獲得之全場像差為獨一無二之特性，結合前述此系統可以量測精確之全場相差的優點，在第二年研究中使用雙Zernike 多項式嘗試研究從擷取的獨特全場像差判斷光學系統中的元件對位誤差的檢測方法。此量測全場像差技術將進一步應用至 光場成像(Light Field Imaging)技術，利用光場 的4D 光線帶有波前相位函數之特性，，使其可以矯正Light Field 所獲得之光場資料，移除像差對於Light Field Imaging 的影響，並對Light Field 的微元件之光學繞射做研究分析，達到無像差光場成像的目的。The principle of this academic research is based on the Grating-Slit optical test method. The 3 years continues research includes the extension application of GS testing, including Aberration Light FIeld Imaging and Multi-elements Opto-Mechanical Alignment. At the initial stage of the research, we are going to use the equipment and the software we already had. A novel grating-lens array structure is used to capture the full field aberration of a optical system in the same time. Due to the unique design of the grating-slit test, it will be the first one to measure full field aberrations in the world. With the measured full aberration data, we will develop the opto-mechanical alignment application in the second year of research. By investigating the perturbation function of the lens mis-alignment, we can derive the misalignment of the lens from the measured full field aberrations of a lens system. The application of Grating-Slit test method will ultimately be the Light field Imaging. The goal is to use the full field aberration measurement technique to correct the Light Field imaging data such that we can have a aberration free light field data. Thus, the Light Field imaging can have a wider field, more precise image depth. This is a breakthrough in the extended depth of field imaging in the aberration field. 研究期間：10008 ~ 10107
