Effect of the Addition of Acrylic Monomers on Mechanical Properties of Patterns Applied in Negative-Type Photoresists

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題名:	Effect of the Addition of Acrylic Monomers on Mechanical Properties of Patterns Applied in Negative-Type Photoresists
作者:	Huang,HY;Chen,H
貢獻者:	化學工程與材料工程學系
日期:	2010
上傳時間:	2012-03-27 16:24:39 (UTC+8)
出版者:	國立中央大學
摘要:	Typically, a negative-type photoresist consists of a polymer binder, polyfunctional monomer (or cross-linker), photo initiator, solvent, and additives. A series of acrylic monomers was prepared as cross-linkers using dipentaerythritol hexa-acrylate (DPHA) and blending monomers with n-butyl methacrylate (BuMA), benzyl methacrylate (BzMA), and acrylic-silica sol (Pro-1264), and the mechanical properties of patterns were studied. The elastic recovery and the compression of the patterns were measured using a dynamic ultra-micro-hardness tester. Patterns of the photo spacer were observed using a scanning electron microscope. Superior mechanical properties (elastic recovery, compression, and surface hardness) of the patterns and the optimum recipe could be obtained by adding 2wt% of acrylic monomers (BuMA or BzMA or Pro-1264) to the photoresists when DPHA was fixed at 10wt%. An inverted conical pattern was observed when 3wt% of Pro-1264 was added to the photoresists when the transmittance of patterns worsened because of the low capacity of the interpenetration network.
關聯:	MOLECULAR CRYSTALS AND LIQUID CRYSTALS
顯示於類別:	[化學工程與材料工程學系 ] 期刊論文

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