English  |  正體中文  |  简体中文  |  Items with full text/Total items : 69561/69561 (100%)
Visitors : 23723391      Online Users : 793
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version


    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/49875


    Title: In situ observation of stress evolution in pure tin strip under electromigration using synchrotron radiation x-ray
    Authors: Wu,AT;Siao,CN;Ku,CS;Lee,HY
    Contributors: 化學工程與材料工程學系
    Date: 2010
    Issue Date: 2012-03-27 16:25:16 (UTC+8)
    Publisher: 國立中央大學
    Abstract: This investigation elucidates stress evolution in situ in tin strips under electromigration using synchrotron radiation x-ray. Minute variations in stress are determined precisely using intense x-rays. Back stresses gradient with the values of 5.5 and 16.5 MPa/cm, which are induced by the current densities of 1 x 10(3) and 5 x 10(3) A/cm(2), respectively, are measured directly. The effective diffusivities that include both grain and lattice diffusion at various current densities are determined. The Joule heating is observed, ranging from 5 to 15 degrees C, according to various current densities passed through the stripes. Results of this study suggest that the protective oxide layer on the surfaces significantly influences the kinetics of stress evolution.
    Relation: JOURNAL OF MATERIALS RESEARCH
    Appears in Collections:[化學工程與材料工程學系 ] 期刊論文

    Files in This Item:

    File Description SizeFormat
    index.html0KbHTML310View/Open


    All items in NCUIR are protected by copyright, with all rights reserved.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback  - 隱私權政策聲明