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    題名: Evolution of RESET current and filament morphology in low-power HfO(2) unipolar resistive switching memory
    作者: Hou,TH;Lin,KL;Shieh,J;Lin,JH;Chou,CT;Lee,YJ
    貢獻者: 化學工程與材料工程學系
    日期: 2011
    上傳時間: 2012-03-27 16:27:09 (UTC+8)
    出版者: 國立中央大學
    摘要: Reduction in RESET current is crucial for future high-density resistive-switching memory. We have reported a unipolar-switching Ni/HfO(2)/Si structure with low RESET current of 50 mu A and RESET power of 30 mu W. In addition, a unique cycling evolution of RESET current across more than two orders of magnitude allows us to probe into the evolvement of filament morphology at nanoscale, using a simple yet quantitative model. Filament morphology was found to depend strongly on the charge-dissipation current proportional to the powers of SET voltage. Moreover, the formation of inactive semiconductive filaments plays an important role in the reduction in RESET current. (C) 2011 American Institute of Physics. [doi:10.1063/1.3565239]
    關聯: APPLIED PHYSICS LETTERS
    顯示於類別:[化學工程與材料工程學系 ] 期刊論文

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