English  |  正體中文  |  简体中文  |  Items with full text/Total items : 67783/67783 (100%)
Visitors : 23095354      Online Users : 305
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version

    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/49993

    Title: Fabrication of Nanometer-Scale Si Field Emitters Using Self-Assembled Ge Nanomasks
    Authors: Lee,SW;Wu,BL;Chang,HT
    Contributors: 材料科學與工程研究所
    Date: 2010
    Issue Date: 2012-03-27 16:28:23 (UTC+8)
    Publisher: 國立中央大學
    Abstract: Large-area, nanometer-scale Si field emitters have been fabricated by selective chemical etching of self-assembled Ge islands on Si. Taking advantage of the relatively low etching rate, uniform Ge islands act as virtual nanomasks for the underlying Si substrate. During selective chemical etching, Ge nanomasks shrink into small Ge-core islands, which determine the apex sharpness of the resulting Si pyramidal tips. The results demonstrate that Si pyramidal tips exhibited improved antireflective and electron field emission characteristics compared to as-grown Ge islands. The high field enhancement factor can be attributed to high tip density, nanoscale apex, and well-controlled spacing between Si pyramidal tips. This work offers a low cost alternative for designing and fabricating high efficiency Si-based field emitters or nanodevices.
    Appears in Collections:[材料科學與工程研究所 ] 期刊論文

    Files in This Item:

    File Description SizeFormat

    All items in NCUIR are protected by copyright, with all rights reserved.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback  - 隱私權政策聲明