Fabrication of Nanometer-Scale Si Field Emitters Using Self-Assembled Ge Nanomasks

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Title:	Fabrication of Nanometer-Scale Si Field Emitters Using Self-Assembled Ge Nanomasks
Authors:	Lee,SW;Wu,BL;Chang,HT
Contributors:	材料科學與工程研究所
Date:	2010
Issue Date:	2012-03-27 16:28:23 (UTC+8)
Publisher:	國立中央大學
Abstract:	Large-area, nanometer-scale Si field emitters have been fabricated by selective chemical etching of self-assembled Ge islands on Si. Taking advantage of the relatively low etching rate, uniform Ge islands act as virtual nanomasks for the underlying Si substrate. During selective chemical etching, Ge nanomasks shrink into small Ge-core islands, which determine the apex sharpness of the resulting Si pyramidal tips. The results demonstrate that Si pyramidal tips exhibited improved antireflective and electron field emission characteristics compared to as-grown Ge islands. The high field enhancement factor can be attributed to high tip density, nanoscale apex, and well-controlled spacing between Si pyramidal tips. This work offers a low cost alternative for designing and fabricating high efficiency Si-based field emitters or nanodevices.
Relation:	JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Appears in Collections:	[Institute of Materials Science and Engineering] journal & Dissertation

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