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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/51044


    Title: Multilayer thin-film inspection through measurements of reflection coefficients
    Authors: Wu,K;Lee,CC;Brock,NJ;Kimbrough,B
    Contributors: 光電科學與工程學系
    Keywords: THICKNESS-PROFILE;INTERFEROMETRY
    Date: 2011
    Issue Date: 2012-03-27 18:16:36 (UTC+8)
    Publisher: 國立中央大學
    Abstract: A vibration-insensitive interferometer is described to measure the thickness, refraction index and surface profile of thin-film stack at normal incidence. By satisfying the continuous boundary conditions of electric and magnetic fields at interfaces in a multilayer film stack, the reflection coefficient phase of the thin-film stack can be distinguished from the phase of spatial path difference, thus thickness and refraction index can be extracted. The experiment results showed that the measurement precision is significantly increased after the phase analysis was added into the reflectance analysis. (C) 2011 Optical Society of America
    Relation: OPTICS LETTERS
    Appears in Collections:[光電科學與工程學系] 期刊論文

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