Quartz has good piezoelectricity and thermal stability. It has been widely used in electronics-industry, such as wave filters, microbalances, and oscillators. The nanopillars on quartz devices, may increase their performance due to the large surface area or produced a self-cleaning surface. The nanopillar structure was fabricated by electron beam lithography (EBL) to produce nanoscale patterns. A chromium thin film was evaporated on quartz surface to avoid the electric charge accumulation. The patterns were written on the resist (Polymethyl methacrylate PMMA). The nanopillars were finally fabricated by wet etching. The limitation and fabrication isuues was evaluated in this research. It was found that the thickness of the resist and the maskant layer are important in fabricating nanoscale patterns. The mask width and its associated undercut are especially critical to have succesful results in quartz anisotropic etching. The relationship and limit of the fabricated pillar geometry and density were also analyzed. It was founded no considerable effects on the pillar length for different pattern widths, spacings, and arrangements. For the structure integrity, the circle patterns are worse than the square patterns. The predicted etching profile was performed from ealier experiments of larger structures, and is found to agree with this present work. The study is helpful in nanosize quartz wet etching in the future.