利用多場像差量測於精密光機對位與光場成像;Application of Multifield Aberration Measurement on Precision Opto-Mechanical Alignment and Light Field Imaging

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/62588

Title:	利用多場像差量測於精密光機對位與光場成像;Application of Multifield Aberration Measurement on Precision Opto-Mechanical Alignment and Light Field Imaging
Authors:	梁肇文
Contributors:	國立中央大學光電科學與工程學系
Keywords:	光電工程
Date:	2012-12-01
Issue Date:	2014-03-17 11:51:43 (UTC+8)
Publisher:	行政院國家科學委員會
Abstract:	研究期間：10108~10207;The principle of this academic research is based on the Grating-Slit optical test method. The 2 years research project includes the extension application of GS testing, including Aberration Light FIeld Imaging and Multi-elements Opto-Mechanical Alignment. At the initial stage of the research, we are going to use the equipment and the software we already had. A novel grating-lens array structure is used to capture the full field aberration of an optical system in the same time. With the measured full aberration data, we will develop the opto-mechanical alignment application in the second year of research. By investigating the perturbation function of the lens mis-alignment, we can derive the misalignment of the lens from the measured full field aberrations of a lens system. The application of Grating-Slit test method will ultimately be the Light field Imaging. The goal is to use the full field aberration measurement technique to correct the Light Field imaging data such that we can have a aberration free light field data. Thus, the Light Field imaging can have a wider field, more precise image depth. This is a breakthrough in the extended depth of field imaging in the aberration field.
Relation:	財團法人國家實驗研究院科技政策研究與資訊中心
Appears in Collections:	[Department of Optics and Photonics] Research Project

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