共光程干涉儀之奈米定位平台研發;Development of Common-Optical-Path Interferometer for Nano-Positioning Stage

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題名:	共光程干涉儀之奈米定位平台研發;Development of Common-Optical-Path Interferometer for Nano-Positioning Stage
作者:	李朱育
貢獻者:	國立中央大學光機電工程研究所
關鍵詞:	電子電機工程;光電工程
日期:	2012-12-01
上傳時間:	2014-03-17 11:51:52 (UTC+8)
出版者:	行政院國家科學委員會
摘要:	研究期間：10108~10207;This project aims at developing the "large-range and multi-dimensional nano-positioning stage" which can efficiently against the environmental disturbances. To achieve this objective, the "common-optical-path interferometry for displacement measurement" and "co-planar positioning device" for displacement position are proposed and presented. Recently, the development of scientific research and modern industry fields trends to micro dimension for large area. In the case of semiconductor, photolithography, imprint lithography, and metrology instrument, the uniform and stable process with large range will succeed in the quality manufacturing and measurements. Therefore, developing the positioning device with both high precision and stability over long-range is an essential critical technique. In this project, we are going to develop the following several novel technologies to achieve the large-range and multi-dimensional nano-positioning stage: Wavelength modulation heterodyne interferometry: Heterodyne light is generated by two orthogonal polarized lights with modulated wavelength light passing through the same geometric path but unbalanced optical path. The signal's phase and the displacement of the target can be obtained by heterodyne detection. Grating shearing interferometry with common optical path configuration: By the common path shearing interferometer configuration, the two dimensional displacement can be measured which can get rid of the background disturbance. Modified grating shearing interferometry with common optical path configuration: It can measure two dimensional displacements and roll motion of the target. Co-planar positioning device for displacement position and feedback control system: To provide co-planar precise positions over large range. By integrating these technologies, we estimate that the stage has both nanometric positioning resolution and stability over tens of millimeter positioning range. Note: The "large-range" refers to the positioning stage can provide tens of millimeter traveling range. The "nano-positioning" refers to the positioning resolution of the stage is nanometric scale.
關聯:	財團法人國家實驗研究院科技政策研究與資訊中心
顯示於類別:	[光機電工程研究所 ] 研究計畫

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