開發電漿輔助化學氣相沉積多層SiOxNy:H/SiNx:H抗反射薄膜並應用於矽晶太陽能電池;Multi-layered SiOxNy:H/SiNx:H Antireflection Coating for Silicon Solar Cells by Plasma Enhanced Chemical Vapor Deposition

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题名:	開發電漿輔助化學氣相沉積多層SiOxNy:H/SiNx:H抗反射薄膜並應用於矽晶太陽能電池;Multi-layered SiOxNy:H/SiNx:H Antireflection Coating for Silicon Solar Cells by Plasma Enhanced Chemical Vapor Deposition
作者:	陳一塵
贡献者:	國立中央大學材料科學與工程研究所
关键词:	材料科技;能源工程
日期:	2012-12-01
上传时间:	2014-03-17 11:53:14 (UTC+8)
出版者:	行政院國家科學委員會
摘要:	研究期間：10111~10210;In this project, SiNx:H/SiOxNy:H multilayer films will be developed using electron cyclotron resonance chemical vapor deposition system as anti-reflection (AR) coating for increasing the photoelectric conversion efficiency of crystalline silicon solar cells. At the first stage of this project, we will run the simulation of SiNx:H/SiOxNy:H multilayer structure with the collaborator in order to obtain the optimized thickness and optical parameters of each layer, which could be used as references for tuning the growth recipes of the anti-reflection layers. In the development of SiNx:H/SiOxNy:H multilayer growth technology, we expect that the reflectance of textured silicon wafers with the developed AR coating could be lowered down to less than 2.5%. By controlling the deposition parameters, the SiNx:H and SiOxNy:H films with low Si content could be achieved, and in doing so the absorption of the films is decreased. The ultimate goal of this project is to assist our collaborator (Taiwan Solar Energy technology Co., Ltd.) to integrate the SiNx:H/SiOxNy:H multilayer deposition technology into the production line of the conventional cell process, and increase the cell efficiency by above 0.2%.
關聯:	財團法人國家實驗研究院科技政策研究與資訊中心
显示于类别:	[材料科學與工程研究所 ] 研究計畫

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