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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/65156

    Title: 平行光式曝光機之研究;The Research of Collimated Exposure Machine
    Authors: 陳彥安;Chen,Yen-An
    Contributors: 光電科學與工程學系
    Keywords: 曝光機;PCB;LCD;微影;exposure machine;lithographic;PCB;LCD
    Date: 2014-07-25
    Issue Date: 2014-10-15 14:41:57 (UTC+8)
    Publisher: 國立中央大學
    Abstract: 本研究進行平行光式曝光機之光學部分研究與發展;從概念發展介
    光做為微影的光源,先以LightTools 設計,再以設計值為藍本,以國產的
    均勻度4%的125mmX125mm 平行光式曝光機,且從設計到製造全由國內
    之廠商完成。本研究所發展之技術可用於PCB 板,FPD 等製程之應用,
    相當值得進一步研究與發展。;In this study, we present a research and development of a collimated
    exposure machine. The introduction of concept of development, the simulation of
    the optical system and the assembly of the optical components. The study of
    collimated exposure machine use xenon short-arc lamp as the light source,
    through a variety of optics ,the light will be homogenized. LightTools is used as
    a design program, then use the optics which are made in Taiwan to build an optics
    system to complete the designation. The result is a 125mmX125mm exposure area
    with 4% uniformity exposure machine. The simulation and the assembly of the
    optical system for the exposure machine use for PCB and FDP manufacture
    process are the major issue of this tractate.
    Appears in Collections:[光電科學研究所] 博碩士論文

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