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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/65898

    Title: 微結構電化學加工底部R角之改善策略分析與實做研究;Implementation research and improvement strategy analysis of microstructure bottom corner in electrochemical machining
    Authors: 洪偉誌;Hong,Wei-chi
    Contributors: 機械工程學系
    Keywords: 微電化學加工;底部R角;Micro electrochemical Machining;Bottom corner radius
    Date: 2014-07-10
    Issue Date: 2014-10-15 17:17:29 (UTC+8)
    Publisher: 國立中央大學
    Abstract: 隨著電子產品的需求度增加,使得各種薄型化微小零組件的需求也隨之大幅提升。以手機鏡頭模組而言,其光學鏡頭承座由於厚度上的差異化,再加上採用高強硬不鏽鋼,無法全部採用沖壓方式進行加工,而現有的製程是採用化學蝕刻減薄後,再結合沖壓下料方式進行加工,其加工時間長(約10~20µm/h),因此,若將蝕刻改以電化學加工的方式,將可大大提升生產量。
    ;The demand for electronic products has been rapidly increasing. The general trend of size reduction and thinning increases the demand for enhanced precision of manufactured products not only in terms of dimension and shape, but also in the roughness quality of the machined surface. To avoid complex assembly and reduce structural rigidity due to miniaturized components, integrally molded parts have been adopted to improve the precision. The stainless steel is often adopted as a miniaturized structural part materials in order to keep strength and anti-wear. But the production speed about 10~20 μm/h is limited by using etching method. Present process mostly adopted chemical etching connected with stamping to fabricate but etching time is too long and machining shape is limited in two dimension.
    This study presents two kinds of micro electrochemical machining processes to shorten the machining time and reduce the bottom corner radius of machined cavity. The high-precision electrode and fixtures is designed to fit the width specifications. The needed pattern and strip thickness of 20μm are removed by electrochemical machining. According to experimental results, the depth will increase with voltage and pulse-on time increasing, the bottom corner is getting smaller. The secondary processing method is better. The minimum radius of 0.094 mm is obtained as voltage of 11 V, pulse-on time of 70μs, pulse ratio of 50:50, electrode gap of 50μm, electrolyte pressure of 2 kg/cm2 and electrolyte concentration of 20 wt%.
    Appears in Collections:[機械工程研究所] 博碩士論文

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