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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/6658


    Title: 次奈米窄帶濾光片之研製與分析;Research of the fabrication of sub-nanometer narrow band pass filter for DWDM system
    Authors: 鄭耀乾;Yao-chien Cheng
    Contributors: 光電科學研究所
    Keywords: 次奈米;窄帶濾光片;光纖通訊;高密度分波多工器;雙離子束濺鍍;subnanometer;narrow band pass filter
    Date: 2001-06-28
    Issue Date: 2009-09-22 10:25:07 (UTC+8)
    Publisher: 國立中央大學圖書館
    Abstract: 目前DWDM技術已在光纖通訊系統扮演重要角色,窄帶濾光片則是其中不可或缺的元件,但由於其規格要求比一般鍍膜產品嚴格甚多,因此製作上困難度很高。 本論文使用Ta2O5 及SiO2 兩種材料,實際由製程選取、建立雙離子束濺鍍系統、尋找適當製程參數到設計與製鍍,逐步完成了次奈米窄帶濾光片之製作與分析。 none
    Appears in Collections:[光電科學研究所] 博碩士論文

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