English  |  正體中文  |  简体中文  |  Items with full text/Total items : 75982/75982 (100%)
Visitors : 28079153      Online Users : 493
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version

    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/6658

    Title: 次奈米窄帶濾光片之研製與分析;Research of the fabrication of sub-nanometer narrow band pass filter for DWDM system
    Authors: 鄭耀乾;Yao-chien Cheng
    Contributors: 光電科學研究所
    Keywords: 次奈米;窄帶濾光片;光纖通訊;高密度分波多工器;雙離子束濺鍍;subnanometer;narrow band pass filter
    Date: 2001-06-28
    Issue Date: 2009-09-22 10:25:07 (UTC+8)
    Publisher: 國立中央大學圖書館
    Abstract: 目前DWDM技術已在光纖通訊系統扮演重要角色,窄帶濾光片則是其中不可或缺的元件,但由於其規格要求比一般鍍膜產品嚴格甚多,因此製作上困難度很高。 本論文使用Ta2O5 及SiO2 兩種材料,實際由製程選取、建立雙離子束濺鍍系統、尋找適當製程參數到設計與製鍍,逐步完成了次奈米窄帶濾光片之製作與分析。 none
    Appears in Collections:[光電科學研究所] 博碩士論文

    Files in This Item:

    File SizeFormat

    All items in NCUIR are protected by copyright, with all rights reserved.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明