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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/6680


    Title: 離子輔助反應射頻磁控濺鍍紫外光薄膜之研究;The study of UV thin film prepared reactive by RF magnetic controlled sputtering with IAD
    Authors: 戴國良;Guo-Liang Dia
    Contributors: 光電科學研究所
    Keywords: 光學鍍膜;氧化鋁;氧化矽;抗反射膜;optical coating;Al2O3;SiO2;AR-Coating
    Date: 2001-06-21
    Issue Date: 2009-09-22 10:25:40 (UTC+8)
    Publisher: 國立中央大學圖書館
    Abstract: 本論文將介紹在射頻磁控濺鍍系統中加入離子輔助法(IAD)製鍍紫外光區(300~400nm)之氧化鋁(Al2O3)及氧化矽(SiO2)之光學薄膜,主要探討離子輔助法對於薄膜折射率、消光係數、穿透率等光學特性之影響,以及薄膜之結晶性,微觀結構表面粗糙鍍之分析,製鍍出一高品質之光學薄膜(高穿透、低吸收),進而能將此材料作疊加設計,以便於提供UV雷射、太空或遙測光學技術方面之應用。 The study of Al2O3 and SiO2 optical thin films prepared by RF magnetron sputtering system with IAD was concerned in this thesis. Due to IAD, we can see the change on optical properties including refractive index、extinction coefficient and transmittance along with micro correction on structure and surface roughness. We can get optical films of better optical properties with IAD. Base on this, we use Al2O3 and SiO2 as relatively high and low refractive index materials to prepare multi-layer coatings for the applications on UV laser、 space and remote sensing technique.
    Appears in Collections:[光電科學研究所] 博碩士論文

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