本論文研究軟X光區域的多層膜高反射鏡及使用銅靶 輻射量測X光反射率，檢測多層膜結構。 關於13.6nm的近垂直入射多層膜高反射鏡，可優化出高反射率的膜層結構。經優化53層鉬矽多層膜，鉬和矽的膜層厚度分別為3.03nm和4.07nm，對S偏振光而言，四分之一波膜堆的理想反射率為69.42%，我們優化後週期性膜堆的理想反射率為72.12%。對p偏振光而言，四分之一波膜堆的理想反射率為65.97%，我們優化後週期性膜堆的理想反射率為69.36%。 由於近垂直入射多層膜高反射鏡對膜厚及粗糙度的要求甚高，因此使用離子束濺鍍法製鍍出非晶態薄膜，藉著銅靶 輻射以掠角入射薄膜，根據Kiessig干涉條紋精準的求得薄膜的特性，包括薄膜密度、消光係數、厚度及各界面粗糙度。求得的結果與原子力顯微鏡比較，並非完全吻合。主要的原因為X光量測的範圍較大，因此提供的訊息是平均值，且包含高頻波。而原子力顯微鏡量測的範圍是局部性，且濾掉高頻波。 The paper is discussed about designing the nearly normal incident multilayer mirrors in the X-Ray region and analyzing the multilayer based on measuring X-Ray reflectivity . For the nearly normal incident multilayer mirrors at 13.6 nm , our program can optimize the structure of the high–reflectivity mirrors . After optimizing the 53 layers Mo/Si mirrors , we can find out that the thickness of the Mo and Si thin film are 3.03nm and 4.07nm . For s-pol. , the reflectivity of the quarter wave stick is 69.42% , and the reflectivity of our design is 72.12% . For p-pol. , the reflectivity of the quarter wave stick is 65.97% , and the reflectivity of our design is 69.36% . It is important for the thickness mistakes and roughness of nearly normal incident multialyer mirrors . We manufacture the amorphous thin film by using ion beam sputtering deposition , and obtain the characteristics of the multilayers by measuring the X-Ray reflectivity of radiation of Cu target , for example the mass density , extinction coefficient , thickness of the thin film and the roughness of the interface . Generally speaking , the roughnesses by fitting X-Ray reflectivity are different from the roughnesses of using AFM . This result is that the area by X-Ray illuminated is larger than by AFM measuring , and X-Ray reflectivity contains the data of high frequency waves.
