本論文將介紹在電阻加熱及電子槍蒸鍍系統中加入離子助鍍法(IAD)製鍍深紫外光區(193nm)之氟化鑭(LaF3)之光學薄膜，主要研究離子輔助法對於薄膜折射率、消光係數、穿透率等光學性質之影響，以及薄膜之水氣吸附、微觀結構、表面粗糙度與結晶性之分析，並探討會令薄膜造成能量損耗的原因，以製鍍出一高品質之光學薄膜，期望能搭配各種低折射率材料做疊加設計，便於提供紫外光區光電科學之應用。 The study of lanthanum fluoride optical thin film deposited by boat and e-beam evaporation (PVD) with ion-assisted deposition (IAD) for UV application was concerned in this thesis. Due to IAD, we can improve optical and micro-structural properties including refractive index、 extinction coefficient、surface roughness and packing density for the production of advanced coatings which are required in laser material processing and semiconductor lithography.
