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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/6717

    Title: 離子輔助熱蒸鍍紫外光學薄膜之研究;Optical Thin Film Deposited with Ion Assisted for UV Application
    Authors: 童啟弘;Chi-Hong Tung
    Contributors: 光電科學研究所
    Keywords: 氟化鑭;紫外光;離子助鍍;ion-beam assisted deposition;ultraviolet;LaF3
    Date: 2002-06-13
    Issue Date: 2009-09-22 10:26:38 (UTC+8)
    Publisher: 國立中央大學圖書館
    Abstract: 本論文將介紹在電阻加熱及電子槍蒸鍍系統中加入離子助鍍法(IAD)製鍍深紫外光區(193nm)之氟化鑭(LaF3)之光學薄膜,主要研究離子輔助法對於薄膜折射率、消光係數、穿透率等光學性質之影響,以及薄膜之水氣吸附、微觀結構、表面粗糙度與結晶性之分析,並探討會令薄膜造成能量損耗的原因,以製鍍出一高品質之光學薄膜,期望能搭配各種低折射率材料做疊加設計,便於提供紫外光區光電科學之應用。 The study of lanthanum fluoride optical thin film deposited by boat and e-beam evaporation (PVD) with ion-assisted deposition (IAD) for UV application was concerned in this thesis. Due to IAD, we can improve optical and micro-structural properties including refractive index、 extinction coefficient、surface roughness and packing density for the production of advanced coatings which are required in laser material processing and semiconductor lithography.
    Appears in Collections:[光電科學研究所] 博碩士論文

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