193nm深紫外光學薄膜之研究The; research of optical thin films in DUV at 193nm

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題名:	193nm深紫外光學薄膜之研究The;research of optical thin films in DUV at 193nm
作者:	劉旻忠;Ming-Chung Liu
貢獻者:	光電科學研究所
關鍵詞:	雷射破壞;光學薄膜;氟化鎂;氟化鑭;氟化鋁;氟化釓;微觀結構;光學特性;折射率;光學損耗;應力;Refractive Index;Laser-Induced Damage Threshold (LIDT);Optical thin films;MgF2;LaF3;GdF3;AlF3;Microstructures;Optical Properties;Stress;Optical Loss
日期:	2005-07-08
上傳時間:	2009-09-22 10:26:49 (UTC+8)
出版者:	國立中央大學圖書館
摘要:	本文中主要研究探討波長193nm深紫外光之光學薄膜，材料以氟化鎂(MgF2)、氟化鑭(LaF3)、氟化鋁(AlF3)與氟化釓(GdF3)四種為主，氟化鎂和氟化鑭以熱阻舟蒸鍍(Resistive Heating Boat Evaporation)與電子束蒸鍍(Electron Beam Gun Evaporation)的方式製鍍光學薄膜，而氟化鋁(AlF3)與氟化釓(GdF3)則只以熱阻舟蒸鍍為主，主要探討薄膜的光學特性、機械特性(應力)、微觀結構與雷射破壞(Laser Damage)。本文並以離子助鍍(Ion Assisted Deposition)方式，研究離子助鍍對薄膜的影響；在薄膜後處理方面則是藉由高溫退火、紫外光照射與雷射退火的方式來對氟化物薄膜處理，研究對膜質特性的影響，希望藉由離子助鍍以及各種後處理的方式來達到改變膜質，進而達到提高折射率、降低光學損耗以及提高雷射損壞的閥值等。最後以四種氟化物互相搭配，以抗反射膜和高反射鏡的設計方式，實際製作成品並量測多層膜的特性，加以分析和討論。如此由單一膜層的特性到多層膜堆應用作一系列完整的研究，最後並且給予四種氟化物製鍍參數上的建議。Optical coating technologies in the deep-ultraviolet at 193nmhave has been researched. Magnesium fluoride thin films and lanthanum fluoride thin films were deposited by resistive heating boat (RH) and electron beam evaporation (EB). Aluminum fluoride thin films and gadolinium fluoride thin films were prepared by RH. The relation of fluorides thin films between the microstructures (including cross section morphology, surface roughness and crystalline structure), the optical properties (including refractive index and optical loss), laser-induced damage threshold (LIDT) and mechanical properties (stress) were investigated. The characteristics and influence of thin films were also studied by ion-assisted deposition (IAD), thermal annealing, ultraviolet light irradiation and laser annealing. The surface roughness, optical loss, stress and LIDT of the films were improved after these treatment. Anti-reflection coatings and multi-layers coatings were designed and deposited by using above four fluoride materials. Then the characteristics of coatings were discussed and compared with each other. Finally, the best deposition parameter of the four fluoride materials were suggested by this research.
顯示於類別:	[光電科學研究所] 博碩士論文

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