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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/6730


    Title: 微型光學讀取頭之元件Optical;Element of Micro-Optical Pickup Head
    Authors: 張育誠;Yu-Cheng Chang
    Contributors: 光電科學研究所
    Keywords: 電漿輔助化學氣相沉積;45°反射鏡面;感應耦合電漿離子蝕刻;氮化矽;低壓化學氣相沉積;全像光學元件;氫氧化鉀;HOE;KOH;45° reflector;ICP;Silicon Nitride;LPCVD;PECVD
    Date: 2003-07-03
    Issue Date: 2009-09-22 10:26:59 (UTC+8)
    Publisher: 國立中央大學圖書館
    Abstract: 我們實驗主要將微光機電系統(Optical MEMS)之技術,應用在光學讀取頭上,製作出微光學元件,包含Grating、Hologram optical element(HOE)和Fresnel lens等等。 本論文主要將光學讀取頭微小化和積體化,且已創新的架構來執行。目前製作微光學元件的方式有很多種,其主要利用SiNx membrane和通道(Via)的基本結構,來縮小整體光學讀取頭;並在SiNx membrane上,利用乾式蝕刻製作微光學元件,是第一次嘗試,其光學效果與傳統光學元件相似。且利用半導體製程技術,可以做到數微米的線寬,因此可以多利用此方法,運用在不同的光學元件上。 另外,我們運用矽基板的晶格結構和濕式蝕刻的技術,蝕刻出45˚的反射鏡面,方便雷射二極體(LD)能夠順利的達到光碟片,且能順利由光接收器(PD)讀取正確的資料,以上的製作方式與光學模擬相符合,已證明可行性,日後的工作就是精確對準封裝的問題了。A new optical pickup head is introduced, with its optical components fabricated by the microoptoelectromechanical (MOEMS) technology. Optical elements, such as grating, holographic optical element and Fresnel lens, are made on the SiN membrane. The SiN film was deposited on the silicon wafer by low pressure chemical vapor deposition (LPCVD) or plasma enhanced chemical vapor deposition (PECVD). Its advantages include the high transmission efficiency, light weight, and easy packaging for this new proposed optical pickup head.
    Appears in Collections:[Graduate Institute of Optics and Photonics] Electronic Thesis & Dissertation

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