本研究分為兩大部分，第一部分為在透明基材上製備抗反射陽極氧化鋁膜，探討不同陽極氧化鋁膜之參數在玻璃與藍寶石基材整體穿透率關係；第二部分則為使用50 nm 之自製陽極氧化鋁模板，並結合電化學沉積法製備出具有雙晶結構銅金屬線。 本研究在透明基材上製備抗反射陽極氧化鋁膜，可藉由孔洞大小調整陽極氧化鋁膜之等效折射率，與利用第一次陽極處理時間與蝕刻時間控制薄膜厚度，可獲得在玻璃與藍寶石基材上陽極氧化鋁膜之最佳參數，使整體透明基材之穿透率有效的提升，達到反射層效果。除此之外，也利用陽極處理與孔洞蝕刻交互進行多次的陽極處理，可對孔洞修飾成錐狀結構，成功製備出類似於蛾眼結構之抗反射膜，達到陽極氧化鋁膜之等效折射率會沿著深度方向成連續變化，而大幅提升透明基材的穿透率。 本研究利用自製的陽極氧化鋁模板結合電化學沉積法進行電鍍，可鍍製直徑約為50奈米且具有雙晶結構的一維銅金屬奈米線，其奈米線的深寬比可高達1200，本研究將調整各種實驗參數，如通電形式、溫度與鬆弛時間等，並利用TEM觀察在不同電鍍參數下的雙晶晶面密度的變化。 ;There are two parts in this study. The first part is to fabricate antireflection anodic aluminum oxide (AAO) film on a transparent substrate, discussing the total transmittance relationship between glass and sapphire substrates with different parameters of AAO film; the second part is to fabricate Cu nanowires with twinned structures by combining the AAO template and electrochemical deposition technique. In this study, the total transmittance is determined by the effective refractive index and thickness of AAO film. The effective refractive index can be controlled by pore size, and the thickness can be controlled by the first anodizing time and etching time. As we obtain the optimal parameters, the total transmittance will be effectively promoted. Moreover, the pore of AAO film can be modified to the cone structure by repeated anodizing process and etching process, and we can obtain a moth-eye structure on AAO film. The total transmittance is significantly promoted by the gradual change of the effective refractive index in depth direction. On the other hand, we fabricate Cu nanowires with twinned structures by combining the AAO template and electrodeposition technique. The diameter of twinned Cu nanowires is about 50 nm, and the aspect ratio is up to 1200. Furthermore, we observe the density change of twins formed in the Cu nanowires under different experimental parameters and electrodeposition conditions by TEM analysis.
