雷射微型投影機波前量測技術;Wavefront Measurement Made By an Off-the-shelf Laser Scanning Pico Projector

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题名:	雷射微型投影機波前量測技術;Wavefront Measurement Made By an Off-the-shelf Laser Scanning Pico Projector
作者:	陳家偉;Chen,Jia-Wei
贡献者:	光電科學與工程學系
关键词:	像差;光學量測;Aberration;Optical Testing
日期:	2015-08-27
上传时间:	2015-09-23 11:31:14 (UTC+8)
出版者:	國立中央大學
摘要:	焦平面量測方法，像是Shack-Hartmann 波前感測器或是相移式條紋投影術，在光學量測的領域裡都非常具有價值。在本篇研究裡，我們提出一個全新的波前斜率量測方法。藉由掃描式振片雷射投影機，高斯光束將會掃描待測光學系統的入瞳。此外，藉由調節角度空間的座標以及四步相移的運算，橫向像差可以依此重建。然後即可利用兩個正交方向的橫向相差，進而重建波前相差。如此即可避免繞射的限制對系統的影響，並且因為此系統解析度決定於CCD像素的使用數目，因此系統重建的波前擁有充足的解析度。我們會利用CodeV模擬此系統，並且預測這個系統量測的結果。並將此系統量測的波前像差與Fizeau干涉儀量測的波前像差以Zernike多項式的項次進行比較，以驗證此系統的量測結果。除此之外，我們對掃描式雷射投影機的能力進行測試。振片面鏡的穩定度大約為1/10個角像素。然而，藉由投影機的非線性分析中，投影機的灰階度被發現僅約30。這也是為何量測結果與Fizeau干涉儀相比之下有誤差的主要原因。在未來中，藉由控制高斯光束的半徑，此系統將可被應用至小型光學系統的量測當中。此外，藉由三個不同波長的雷射二極體，此系統也可以發展成單張圖片量測系統。 ;Focal plane testing methods such as Shack-Hartmann wavefront sensing or phase shifting deflectometry are valuable tools for optical testing. In this study, we propose a novel wavefront slope testing method that uses a scanning galvo laser projector, where the single mode Gaussian beam scans the pupil of the tested optics in this system. In addition, the ray aberration is reconstructed by four step phase shifting measurement by modulating the angular coordinates. The wavefront aberration can then be reconstructed from the two orthogonal ray aberrations. The system is simulated in CodeV for predication of the results. In this way, the diffraction limit can be avoided and it provides sufficient resolution depend on the projector resolution we used. The measured wavefront is cross-verified by the Fizeau interferometer in terms of Zernike polynomials. Additionally, we test the ability of the laser scanning projector. The galvo-mirror stability is about 1/10 of an angular pixel. However, through the nonlinearity analysis, the grayscale ability of the laser projector is noticed that only about 30. This is the main reason why the results have error compared with that tested by the Fizeau interferometer. In the future, this system will be applied to small optical system measurement by controlling the Gaussian beam radius. It will also be developed into a single frame measurement system with three different wavelength laser diodes.
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