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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/68487

    Title: 奈微米球粗化基板技術 暨提升OLED元件出光效率研究
    Authors: 陳麒安;chen,chi-an
    Contributors: 能源工程研究所
    Keywords: 奈米球;粗化基板;OLED;ICP;提升光取出效率;nanospheres;OLED;ICP;EQE
    Date: 2015-07-29
    Issue Date: 2015-09-23 11:57:03 (UTC+8)
    Publisher: 國立中央大學
    Abstract: 本研究以電感應耦合電漿蝕刻系統(Inductively coupled plasma ICP)搭配二氧化矽奈米球作為蝕刻阻擋層進行玻璃基板的粗化。並利用粗化基板對提升有機發光二極體(Organic light emitting diode OLED)元件的發光效率。
    在乾蝕刻製程中作為蝕刻遮罩的二氧化矽奈米球在整個製程中扮演了非常重要的角色。由於隨蝕刻製程進行奈米球會逐漸消失,在不同的蝕刻參數下奈米球會殘留不同的形態並對應不同的奈米結構,調整蝕刻的時間就可以得到不同的奈米結構。蝕刻完的基板皆以掃瞄式電子顯微鏡(Scanning electron microscope SEM)觀察其形態,可依照結果調整蝕刻參數製作有不同奈米結構的基板。
    ;The thesis of this research is operating inductively coupled plasma (ICP) system to etch single layer SiO2 spheres on the glass substrate to fabricate nanostructure substrates for further organic light emitted diode (OLED) device applications.
    The SiO2 sphere mask is very important in this etching process. Because the SiO2 sphere mask will extinct as etching recipe going gradually, it can cause different structures when etching time changed. After etching process, we also use scanning electron microscope (SEM) to observe the structure. We can use different recipe to fabricate different nanostructures on glass substrate, and find which nanostructure can let more light go through the patterned glass substrate than the reference substrate.
    After etching glass substrates, we use these substrates with nanostructure and reference substrate to development OLED devices, and also measure the external quantum efficiency (EQE) of all OLEDs. After measuring OLED devices, we find that the substrate which has spike structure(etching 800 second) enhances 46% at luminance 1000nits and enhances 41% at 3000nits. This research approves that these patterned substrates can be used in further OLED device applications in the future.
    Appears in Collections:[能源工程研究所 ] 博碩士論文

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