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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/6854

    Title: 193nm深紫外光氟化物混合膜之研究The;research of fluoride composite film in DUV at 193nm
    Authors: 李金翰;Chin-Han Lee
    Contributors: 光電科學研究所
    Keywords: 深紫外;氟化物混合膜;193nm;composite film;fluoride film;DUV;193nm
    Date: 2006-06-30
    Issue Date: 2009-09-22 10:30:19 (UTC+8)
    Publisher: 國立中央大學圖書館
    Abstract: 本文中主要研究探討波長 193nm 深紫外光之混合膜,混合材料為氟化鋁(AlF3)、氟化鎂(MgF2)。氟化鋁以熱阻舟蒸鍍(Resistive Heating Boat Evaporation)、氟化鎂以電子束蒸鍍(Electron Beam Gun Evaporation)的方式製鍍光學薄膜,並使用光譜儀、橢圓偏振儀、電子顯微鏡、原子力顯微鏡、X-Ray繞射和傅利葉紅外光譜儀來探討薄膜的光學特性、微觀結構,以找出較佳的混合膜製鍍參數。AlF3 and MgF2 are both popular low refraction index materials which are used for coatings in UV region. In the experiment, we deposited AlF3 and MgF2 simultaneously at various depositing rate to form mixed thin films. We then further study these films by Spectrometer, Ellipsometer, SEM, AFM, XRD and FTIR, trying to investigate the properties of the mixed films and find out the best composition.
    Appears in Collections:[光電科學研究所] 博碩士論文

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