自我複製結構膜之設計、製作與應用Design,; fabrication and application of Autocloned thin films

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題名:	自我複製結構膜之設計、製作與應用Design,;fabrication and application of Autocloned thin films
作者:	張德宏;Te-Hung Chang
貢獻者:	光電科學研究所
關鍵詞:	光子晶體;自我複製技術;電子槍蒸鍍;奈米小球;autocloned;photonic crystal;nanosphere;E-beam gun
日期:	2009-06-24
上傳時間:	2009-09-22 10:31:00 (UTC+8)
出版者:	國立中央大學圖書館
摘要:	本研究之自我複製技術有別於常用的濺鍍法，使用電子束蒸鍍(E-beam gun evaporation)與離子源助鍍(ion-assisted deposition)系統，來製作自我複製結構膜，此系統可增加自我複製結構膜的製程速度與大面積製作。本論文研究並探討自我複製技術(autocloning technique)如何應用在週期性結構膜(periodic structural films)上，自我複製式技術主要在週期性基板鍍上高低折射率材料，在一定的製程條件下，多層膜可維持週期性的結構，而形成鋸齒狀結構的光子晶體(photonic crystal)。單層的鋸齒狀結構形成的機制，可利用蝕刻與再沉積技術的模擬方法(simulation method for etching and redeposition technologies)來模擬單層週期性結構膜(adjusting layer)表面形貌的變化，用來調整並控制自我複製結構膜的形狀，得到我們所預期的單層週期性結構膜。接著再利用多層膜技術，調整沉積、蝕刻與再沉積速率，來達到多層的鋸齒狀結構。在元件的設計上，我們利用有限時域差分法(FDTD)為基礎來模擬自我複製式結構膜層的光子能隙大小與位置，並建立一套用來設計光子晶體的模型，以及利用此模擬結果來設計二維偏振分光鏡(PBS)，並成功製鍍出2D autocloned-type PBS，P/S偏振效應在波長1100 nm-1300 nm的平均比值達到139。形狀結構的quality在厚度為3 um也達到0.8以上，6 um也達到0.7以上，8 um也達到0.6以上。此外，更進一步分析偏振片的模擬與實驗值的差異性。此偏振分光鏡主要工作波長在近紅外線區，適用於生物醫學應用。Autocloning technique is one of the fabrication methods to produce the photonic crystals and periodic structural films. The process began with the periodic corrugation pattern on a substrate. We fabricated the photonic crystals after the deposition of stacks by using an E-beam gun evaporation with ion-assisted deposition on the periodic corrugation patterns of substrates. Two kinds of dielectric films, such as Ta2O5 and SiO2, are stacked alternately on the substrate by thin-film deposition and sputter etching to form a zigzag multilayer coating. The surface evolution of the first layer, adjusting layer, depended on the etching and redeposition effects. The numerical simulation of the etching and redeposition processes was used to regulate and control the shape of the adjusting layer of the photonic crystals. We also design a 2D Photonic-crystal Polarization Filter with Dual-band and Wide Working Wavelength Range. The fabrication of the photonic-crystal polarization filter is based on an autocloning method which integrated the techniques of lithography and thin film deposition. We also analyzed the thickness ratio effect, wavy structure angle effect and anti-reflection effect on the PBS by FDTD. The photonic bandgap has been achieved by adjusting different structural parameters. The optimized ratio of thickness has been calculated by adjusting different thicknesses of the materials and the different angles of the wavy structures. The optimized structural parameters for PBSs was designed and AR coating was used to reduce the ripples. PBS made using 2D PhCs with wide working wavelength range about 200 nm in 1100 nm-1300 nm and achieved average P/S ratio 139 in 1100-1300 nm. The quality of Autocloning structure can be better than 0.8 at thickness ~3 um, 0.7 at thickness ~6 um, and 0.6 at thickness ~8 um. The results of the numerical simulation and the experimental results both show that the bandgap and wavelength range performed very well after the deposition of multilayers with appropriate IAD parameters.
顯示於類別:	[光電科學研究所] 博碩士論文

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