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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/69234


    Title: 聲波聚焦噴墨搭配菲涅爾透鏡之設計
    Authors: 吳晉安;Wu,Jin-an
    Contributors: 機械工程學系
    Keywords: 聲波聚焦噴墨;空氣透鏡;向下噴墨;供墨系統改良
    Date: 2015-10-19
    Issue Date: 2015-11-04 17:51:57 (UTC+8)
    Publisher: 國立中央大學
    Abstract: 聲波聚焦噴墨是利用聲波聚焦透鏡,使聲波產生之聲能聚焦於液體表面上,讓液體能突破其表面張力進而噴出液滴之噴墨技術,若以此法進行噴墨,結構上則無須噴嘴設計,改善傳統噴墨中因噴嘴堵塞之缺點,也因無噴嘴之設計帶來其他限制,論文中將針對這些限制來進行設計。
    在過去研究聲波噴墨中,多數人皆致力於提升噴墨聚焦之能量,以及在聚焦圖形上做變化,讓噴墨產生不同之效果,而此噴墨方式最具特色之處在於無噴嘴且液面須維持在特定高度,所以過往受重力影響,若將噴墨端向下擺放,因無噴嘴所以無法阻擋液體向下流動,所以向下噴墨始終無法實現,這方面之研究甚少。在本論文中,利用虹吸現象突破以往無法向下噴墨之劣勢,並使供墨裝置在無外加動力下能長時間持續噴墨。顧慮到長時間噴墨,若聚焦圓環與墨水結合,將大幅降低噴墨效果,所以將聚焦圓環設計成薄膜與壓電陶瓷結合,使其能進行更換,而圓環薄膜之製作則是利用翻模技術,同一件母模可製作出多個圓環薄膜,無論在材料上、製程上都大幅節省其成本。目前在元件測試上,給予壓電陶瓷70 Vpp、2.4M Hz之訊號,使向下噴墨能夠順利射出液滴大小約為720 µm,噴速約為0.29 m/s。
    ;In this paper, acoustic wave liquid ejectors with replaceable Fresnel lens membrane by using PDMS soft-lithography is proposed with integration of a siphoning structure system. This paper reports a new acoustic-wave liquid ejector with siphoning structure, which overcomes the limit of upward jetting direction and can automatically supply the ink without external electrical power. For long-term ejections, the focusing device is designed to be replaceable, for either annular patterned Fresnel lens membrane or piezoelectric transducer. By replacing the patterned Fresnel lens membrane, ink clogging on the ejector surface for 3D printing application can be avoided.
    Appears in Collections:[機械工程研究所] 博碩士論文

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