中大機構典藏-NCU Institutional Repository-提供博碩士論文、考古題、期刊論文、研究計畫等下載:Item 987654321/6982
English  |  正體中文  |  简体中文  |  全文笔数/总笔数 : 78818/78818 (100%)
造访人次 : 34721962      在线人数 : 1341
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜寻范围 查询小技巧:
  • 您可在西文检索词汇前后加上"双引号",以获取较精准的检索结果
  • 若欲以作者姓名搜寻,建议至进阶搜寻限定作者字段,可获得较完整数据
  • 进阶搜寻


    jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/6982


    题名: 利用濕式蝕刻製作圖樣化藍寶石基板於發光二極體之研究;A study on patterned sapphire substrates light-emitting diodes by using wet etching
    作者: 李克濤;Ko-Tao Lee
    贡献者: 光電科學研究所
    关键词: 圖樣化藍寶石基板;發光二極體;垂直式發光二極體;雷射剝落法;濕蝕刻;patterned sapphire substrate;light-emitting diode;vertical-type LED;chemical wet etching;laser lift-off
    日期: 2007-07-06
    上传时间: 2009-09-22 10:33:55 (UTC+8)
    出版者: 國立中央大學圖書館
    摘要: 本論文主要探討使用化學濕式蝕刻法來蝕刻藍寶石基板及其在雷射剝落法製作垂直式藍色發光二極體上之應用。化學濕式蝕刻其優點在於製程快速、成本低廉、選擇性佳且蝕刻之晶面光滑。圖樣化藍寶石基板可以降低氮化鎵磊晶層之錯位密度,提升磊晶品質,不同線寬之光柵式圖形對發光效率有不同之影響。圓洞狀圖樣化藍寶石基板可將發光二極體之電激發光強度提升2倍強。另外,使用晶片鍵合技術及雷射剝落法將氮化鎵磊晶層由散熱差的藍寶石基板移轉至散熱好的矽基板上製作之垂直式藍色發光二極體,並藉由在單一雷射脈衝區域內不同位置之光激發光光譜品質改變,了解脈衝雷射轟擊對氮化鎵磊晶層之影響。最後我們結合濕式蝕刻、晶片鍵合及雷射剝落技術製作出高品質氮化鎵磊晶之垂直式發光二極體。此一製程可在雷射剝落製程後完成垂直式之出光側之光柵圖形轉印,直接製作出光表面處理,提升其光激發光強度達2.86倍。In this study, we prepared a patterned sapphire substrate by chemical wet etching for the fabrication of vertical type blue light-emitting diode by laser lift-off process. The advantages of chemical wet etching are fast process, low cost, good selectivity and smooth etching surface. The patterned sapphire substrate can decrease the dislocation density of GaN epilayer and improve the luminous efficacy, which is also a function of the line-width of stripe grating patterns. The intensity of electroluminescence of the circular patterned sapphire substrate light-emitting diode is 2 times large than the conventional LED. The wafer bonding and laser lift-off techniques were used to transfer GaN epilayer from sapphire substrate to silicon substrate to form the vertical type light-emitting diode. In addition, we investigated the impact of pulsed excimer laser epilayer by examining the photoluminescence spectra on different sites of GaN after the laser lift-off process. We will combine chemical wet etching, wafer bonding and laser lift-off techniques to fabricate the light-emitting diode with high quality GaN epilayers. Thd pattern can be transferred after laser lift-off process and increase the photoluminence intensity to 2.86 times large than conventional structures.
    显示于类别:[光電科學研究所] 博碩士論文

    文件中的档案:

    档案 大小格式浏览次数


    在NCUIR中所有的数据项都受到原著作权保护.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明