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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/7167


    Title: 超薄ITO透明導電膜應用在觸控面板之研究;Reliability and Stability in Electrical Properties of Ultra-thin ITO for Touch Panel Application
    Authors: 蔡宗典;Tsung-tien Tsai
    Contributors: 光電科學研究所碩士在職專班
    Keywords: 觸控面板;氧化銦錫;濺鍍;sputter coating;Touch Panel;Indium Tin Oxide
    Date: 2008-07-02
    Issue Date: 2009-09-22 10:51:10 (UTC+8)
    Publisher: 國立中央大學圖書館
    Abstract: 本文使用直流磁控濺鍍在玻璃基板表面沉積ITO透明導電膜,研究超薄的ITO膜厚從2nm到100nm的電阻率、穿透率、微觀結構、表面粗糙度等薄膜特性,以及探討在觸控面板上的環境耐久性與ITO鍍膜製程的關係。 氧化銦錫(ITO)在可見光區擁有高穿透率以及低電阻率的透明導電膜,通常應用在平面顯示器的電阻率約2E-4Ωcm。但是應用在觸控面板的透明導電膜需要較高的電阻率(常見的面阻抗約300 ~1000Ω),為了得到較高的面電阻,透明導電膜的膜厚需要變得很薄,而膜厚太薄的薄膜會產生許多問題,包括電性的不穩定、面阻抗的不均勻、環境測試能力變差,本論文即要探討研究此改善方向,先針對ITO膜厚對於其結構與光電特性之研究,並且透過調整反應氣體O2的含量以及濺鍍功率密度來改善ITO薄膜特性,以符合觸控面板的透明導電膜之要求。 實驗結果可知,ITO薄膜在膜厚為8nm、濺鍍功率密度為0.38 w/cm2、氧氣含量2.6%,可達到穿透率大於91%,面阻抗值為500Ω/□之ITO導電玻璃,並可符合觸控面板所要求的耐高溫測驗(160℃,30分鐘)、恆溫恆濕測驗(60℃,90%相對濕度,240小時)、以及耐鹼測驗(NaOH 5%,10分鐘)。 This study uses DC magnetron sputtering to deposit indium tin oxide(ITO) thin film on a soda-lime glass surface to study thin-film properties of an ultra-thin ITO that have a thin-film thickness of 2nm-100nm,Resistivity, transmittance, thin-film structure morphology and surface roughness were determined. This study also examines the relationship between ITO coating processes and reliability testing. Indium tin oxide is a transparent conducting thin film that has a highly visible transmission and low resistivity. In Flat Panel Display applications, ITO resistivity is typically 2E-4Ωcm. However, in the touch panel applications, the transparent conductivity oxide (TCO) film requires high resistivity (sheet resistance is approximately 300-1000Ω). To increase sheet resistance, the TCO film should be thin; however, this has many disadvantages, including unstable electrical properties, non-uniform sheet resistance, and poor reliability and durability. This study attempts overcome these problems. This study investigated the effects of various ITO thicknesses on thin-film structure and photoelectric properties, and then fine tuned optimal oxygen gas flow and deposition power density to improve ITO thin-film properties, such that they meet touch panel requirements. Experiments results demonstrate that an ITO thickness of 8nm was deposited using a coating process with a power density of 0.38 w/cm2 and oxygen gas flow of 2.6%, that has 91% transmittance and a sheet resistance of 500Ω/□, the ITO thin film also passed all reliability tests, including heat testing (160℃, 30 mins), humidity testing (60℃, 90%RH, 240hrs) and alkaline testing (NaOH 5%, 10mins).
    Appears in Collections:[光電科學研究所碩士在職專班 ] 博碩士論文

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