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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/7244


    Title: 氮化鎵高數值孔徑微透鏡之設計、製作與特性分析;Design, fabrication and testing of high-numerical-aperture GaN microlens
    Authors: 李明洪;Ming-Hung Lee
    Contributors: 物理研究所
    Keywords: 灰階光罩聚焦斑點;氮化鎵;微透鏡;數值孔徑;繞射式光學元件;折射式光學元件;numerical aperture;diffractive optical elements;High-NA;GaN;microlens;DOE's;gray-level mask;spot size;refractive optical elements;ROE's
    Date: 2002-06-22
    Issue Date: 2009-09-22 10:53:14 (UTC+8)
    Publisher: 國立中央大學圖書館
    Abstract: 摘 要 近年來,微光機電領域發展蓬勃,成為相當熱門的領域。本論文以灰階光罩技術製作繞射式光學元件,以熱熔融方式製作折射式光學元件。以藍光雷射(405nm)量測微透鏡光學性質。此光學元件可應用於光碟機讀寫頭上的物鏡。 論文主要在於說明微透鏡的設計、製作與光學量測。繞射式光學元件設計,採光程差理論﹔以微影製程、灰階光罩技術與感應式耦合電漿蝕刻製作元件﹔並量測其光學性質,如聚焦在焦平面的斑點、焦距與數值孔徑。折射式光學元件設計,採造鏡者理論﹔以微影製程、熱熔融技術與感應式耦合電漿蝕刻製作元件﹔並量測其光學性質,如聚焦在焦平面的斑點、焦距與數值孔徑。光學量測則是將雷射光束通過微透鏡聚焦在CCD上,擷取影像,分析其斑點尺寸大小。量測結果如下: NA=0.01, aperture=3.6mm, focal length=145mm, spot size=16.3μm NA=0.05,aperture=1mm, focal length=0.95mm, spot size=4.3μm. Abstract Plano-convex diffractive microlenses were fabricated in GaN-based materials with a gray-level mask for the first time. The surface relief of the gray-level diffractive microlens on photoresist was transferred onto GaN by inductively coupled plasma etching technique. The microlenses were characterized with a blue laser diode emitting at 405nm. The focal length of the GaN diffractive microlens is 14.5cm. The potential of the realization of the high-numerical-aperture diffractive microlens in GaN with gray-level mask is discussed.
    Appears in Collections:[Graduate Institute of Physics] Electronic Thesis & Dissertation

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