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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/72916


    Title: 短波紅外線之陣列型濾光片設計;Array filter for short wave infrared applications
    Authors: 陳柏翰;Chen, Po-Han
    Contributors: 光電科學與工程學系
    Keywords: 陣列型濾光片
    Date: 2017-01-23
    Issue Date: 2017-05-05 17:16:30 (UTC+8)
    Publisher: 國立中央大學
    Abstract: 本論文主旨為在短波紅外線(Short Wave Infrared, SWIR)波段內用馬賽克(mosic)排列方式製作出一片具有四種窄帶濾光功能的陣列濾光片,若將此濾光片結合640 X 512像素焦平面感測器(focal-plane array (FPA) image sensor),將可在SWIR波段內即時呈現出四種對應的影像將可提供軍事偵察、穿透煙霧環境影像及夜視之功能。
    四窄帶陣列濾光片的中心波長分別為905nm、950nm、1055nm、1550nm,經光學薄膜設計出所需膜層後,運用微影曝光製作出圖案,藉由雙電子槍離子助鍍鍍膜機製作薄膜,經重複四次微影、鍍膜完成後再加入金屬遮光層來避免不需要的波段穿透濾光片的陣列縫隙,即完成四窄帶陣列濾光片的製作。
    ;This paper aimed to design and fabricate an optical device with four narrow-band-pass filters arrange by using a mosaic array pattern of the different wavelength range in SWIR(Short Wave Infrared). When the filter were bundled on a SWIR image sensor of 640X512 in resolution pixels, the four images of the different wavelength can be analyzed at the same time for the application of military surveillance, seeing through foggy and smoggy environment and night vision.
    The central wavelengths of these four narrow-band-pass filters are 905nm, 950nm, 1055nm, and 1550nm, respectively. The fabrication of the filters were using a dual electric gun deposition system with ion assisted deposition after the lithography process. Repeating four times of lithography and deposition process and black matrix coating, the optical device processes were completed.
    Appears in Collections:[光電科學研究所] 博碩士論文

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