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    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/72936


    題名: 二硫化鉬及二硫化鎢電晶體的 低頻雜訊行為;Behaviors of Low-Frequency Electrical Noise in MoS2 and WS2 Field-Effect Transistors
    作者: 劉彥伯;Liu, Yen-Po
    貢獻者: 物理學系
    關鍵詞: 1/f 雜訊;低頻雜訊;過渡金屬硫屬化合物;二維材料;二硫化鉬;二硫化鎢;1/f noise;Low-frequency noise;Transition metal dichalcogenides;2D material;MoS2;WS2
    日期: 2017-01-11
    上傳時間: 2017-05-05 17:19:01 (UTC+8)
    出版者: 國立中央大學
    摘要: 在這篇論文中,我們研究化學沉積法成長的單層二硫化鎢(WS2)和二
    硫化鉬(MoS2)場效電晶體元件的電子傳輸特性與低頻雜訊表現。我們測量單層二硫化鎢和二硫化鉬的電流-電壓曲線得知兩材料皆為N型半導體,同時也由此計算出材料的電子遷移率。單層二硫化鎢和二硫化鉬的電子遷移率分別為1-2 cm2/Vs和30-40 cm2/Vs。單層二硫化鎢電晶體的低頻雜訊行為和在高電子濃度(大於3 × 1013 cm-2)下單層二硫化鉬電晶體的低頻雜訊表現。
    低頻雜訊強度與電子濃度的關係可以判斷1/f 雜訊是來自電荷數目
    的擾動還是電荷遷移率的擾動。低頻雜訊強度與電子濃度的關係是找出
    1/f 雜訊的電流擾動的來源的重要課題。在我們的工作中發現,單層二硫化鎢電晶體的1/f 雜訊雖然γ=1.5不符合Hooge empirical low,但雜訊表現可以判斷此1/f 雜訊可能是源自於電荷遷移率擾動,而單層二硫化鉬電晶體在高電子濃度下的1/f 雜訊是源自於電荷數目的擾動。;In this thesis, we study electrical transport properties and low frequency noise behaviors on chemical-vapor-deposition (CVD) monolayer WS2 and MoS2 FETs devices. We measure the transfer function and the IV characteristics, and N-type semiconducting behaviors of both WS2 and MoS2
    are also obtained. The mobility of single-layered WS2 and MoS2 are 1-2 cm2/Vs and 30-40 cm2/Vs, respectively. Moreover, the low-frequency noise behavior of monolayer WS2 FETs is investigated, and low frequency noise performance in high carrier density (above 3 × 1013 cm-2) of monolayer MoS2 FETs is discussed in Chapter 3.
    Carrier density dependence of low frequency electrical noise is a way to determine whether the 1/f noise is dominated by fluctuations in carrier number or carrier mobility. Carrier density dependence is an important topic to characterize the source of electrical current fluctuation forming 1/f noise out. Our experimental results show that 1/f noise of CVD single-layer WS2 FETs is dominated by fluctuation of carrier mobility, although γ=1.5 of this WS2 1/f noise deviates from Hooge empirical law, and 1/f noise of CVD single-layer MoS2 FETs at high carrier density regime is dominated by fluctuation of carrier number.
    顯示於類別:[物理研究所] 博碩士論文

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