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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/75174


    Title: 奈米球鏡微影術應用於奈米光電元件之研製;Fabrication of Nanoscale Optoelectronics Devices using Nanospherical-Lens Lithography
    Authors: 周孟誠;Chou, Meng-Cheng
    Contributors: 光電科學與工程學系
    Keywords: 光電元件;奈米球;奈米球鏡微影術
    Date: 2017-07-06
    Issue Date: 2017-10-27 17:17:24 (UTC+8)
    Publisher: 國立中央大學
    Abstract: 在本研究中,我們利用奈米球鏡微影術(nanosphere-lens lithography )與二次蝕刻技術製作氮化鎵(GaN)發光二極體(LED)奈米柱(nanorod)陣列。奈米球鏡微影術能以低成本的方式製作大面積的奈米結構陣列,不需要使用昂貴的電子束微影製程(E-beam Lithography)、極紫外線(Extreme Ultraviolet, EUV)的黃光微影製程。除了成本低廉之外,許多研究團隊發現奈米結構會影響氮化鎵發光二極體的光電特性,例如偏振方向,奈米柱的幾何形狀與量子井發光的偏振方向有密切的關係。;Gallium nitride (GaN) nano-rod light emitting diodes (LEDs) have been an attractive research topic because of their enhanced light extraction efficiencies and other unique electro-optical properties. In this project, we fabricate GaN nano-rod LED arrays with nanosphere-lens lithography (NLL) and a two-step etching technique. The NLL technology is a low-cost approach to fabricate large-area nanostructure arrays, without resorting to expensive facilities, e.g. e-beam lithography and extreme ultraviolet (EUV) lithography process.
    Appears in Collections:[光電科學研究所] 博碩士論文

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